Mitsubishi Chemical has announced the推进 of ultra-high-purity colloidal silica commercialization, with plans to build new production facilities at its Kyushu plant in Kitakyushu, Japan, targeting commercial production by October 2028-
Colloidal silica is a critical material for semiconductor manufacturing - used in wafer surface polishing agents and as raw material for chemical mechanical polishing (CMP) slurries for wafer interconnect layers-
Mitsubishi will use ultra-high-purity tetramethoxysilane as raw material with an integrated process to produce ultra-high-purity colloidal silica with extremely low impurity levels-
Key takeaway for customers: The AI and data center boom is driving strong demand for high-purity silica in semiconductor applications - opening new high-value market segments beyond traditional rubber and tire applications.
Source: China Chemical Industry News, August 25, 2026
